Square Molybdenum Sputtering Target
Melting Point: 2610 ℃
Boiling Point: 5560℃
Application: In the eclectic industry the molybdenum sputtering target mainly use in two-dimensional display, thin-film solar cell’s electrode and wiring material and barrier material of semiconductor.
Density requirement: In order to reduce the air hole of molybdenum sputtering target to improve the properties of sputtering film usually require the target has higher density. The density of target not only influences sputtering rate, it also influences film’s electrical and optical property. The density is higher, the properties of film are better. Besides, to improve target’s density and strength so molybdenum sputtering target can bear the thermal stress well during sputtering. So density is the key performance of molybdenum sputtering target.
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Tel.: +86 592 5129696/86 592 5129595
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